titanium sputtering target

Categories:Metal Sputtering Target

Country/Region:china

...Sputtering Targets come in varying thicknesses, ranging from 10mm to 600mm, giving you flexibility in choosing the perfect target for your specific coating requirements. In addition, our targets can be customized to fit your desired configuration, whether you need a single target or multiple targets. Our Metal Sputtering Targets...

Brand Name:JINXING

Model Number:Chromium Tube Sputtering Target

Place of Origin:China

...Sputtering Target Chromium tube sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/cm3. Soluble in strong alkali solution. Chromium has a high corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal Description Chromium Tube Sputtering Target

Brand Name:JINXING

Model Number:Chromium Plate Sputtering Target

Place of Origin:China

... corrosion resistance, and oxidation is slow in the air, even in the state of red heat. Insoluble in water. Protection by plating on metal Description Chromium Sputtering Target,

Brand Name:Changsheng

Model Number:ASTM F67,ASTM F136 ASTM B381

Place of Origin:China

...Sputtering targets are materials used to grow thin films by the sputtering process. These targets are fabricated from high-purity metals or ceramics through advanced melting, sintering, synthesis, and precision machining techniques. We provide sputtering targets...

Brand Name:Changsheng

Model Number:ASTM B348

Place of Origin:China

... melting, sintering, synthesis, and precision mechanical machining. We offer sputtering targets in a variety of materials, purities, and shapes, combining modern manufacturing techniques and strict quality control. Fabrication methods and parameters are

Brand Name:Changsheng

Place of Origin:China

Model Number:Ti,Ti-Al, Zr, Cr. etc.

Description Sputtering targets are materials from which thin films are grown by a sputtering method. These targets are fabricated by processing metals or ceramics. We offer sputtering target products in a wide range of materials, purities, and shapes by ...

Brand Name:Good Quality Zirconium Cathodes Planar Sputtering Targets For Coating

Model Number:plates

Place of Origin:China

...Sputtering Targets for Coating FANMETAL company produces Zirconium Cathodes Planar Sputtering Targets in a variety of shapes, such as discs, rectangles, columns, steps, and custom shapes. Typical diameters for round targets are 1 inch, 2 inches, 3 inches, 4 inches or 50mm, 60mm, 80mm, 100mm, etc. Zirconium targets...

Brand Name:ZCQ

Model Number:ZCQ

Place of Origin:China

High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...

Brand Name:JINXING

Model Number:Zirconium Sputtering Target

Place of Origin:China

Zirconium Cylindrical Sputtering target for PVD Vacuum Coating Planar Sputtering target for PVD vacuum coating machine is widely used in Multi-arc ion or Magnetron Sputtering PVD vacuum coating industry for decorative PVD coating or functional coating, we...

Brand Name:JINXING

Model Number:Zirconium Target

Place of Origin:China

... grade and alloy 5. by request 6.Type: plane target, step target, rotating target 7.Standard: national standard, American standard, German standard can be produced. 8.Status: cold working status 9.Production process: sponge ...

Brand Name:Jinxing

Model Number:TiAl Ti70Al30 Sputtering Targets

Place of Origin:China

...Sputtering Targets JX offers a wide range of Ti Al Sputtering Targets for decorative and/or wear resistance coatings to provide black, gold, silver, red and rainbow color simulation on items such as cell phone, watch, glasses, bath parts and hardware, artwork, etc. Ti, Cr, Zr, TiAl, Ni, Cu, Stainless Steel, etc. Cr and TiAl targets...

Brand Name:Good Price Zirconium Niobium Sputtering Target

Model Number:plates

Place of Origin:China

Good Price Zirconium Niobium Sputtering Target Zirconium Niobium Sputtering Target 10 (niobium-zirconium, Nb-Zr 90/10 wt%). We professional manufacturing Nb-10Zr alloy target, Make the hydrogenation dehydrogenization niobium powder into electrode and ...

Brand Name:Feiteng

Model Number:Titanium Tube Target

Place of Origin:Baoji, Shaanxi, China

Titanium Tube Target 150OD*125ID*1091L ASTM B861-06 a There is often a word in the semiconductor industry, target material, semiconductor material can be divided into wafer material and packaging material, packaging material has a relatively low technical barrier compared to wafer manufacturing materials.There are seven kinds of semiconductor materials and chemicals involved in the production of wafers, one of which is the sputtering target

Categories:Sputtering Target

Country/Region:china

...ough precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering. Application Areas 1.Semiconductor Memory Chips: Used for

Categories:Sputtering Target

Country/Region:china

...sputtering target is a high-purity functional material widely used in solar cells, semiconductor coatings, optical coatings, and magnetic materials. The product is made from high-purity praseodymium metal through precision processing, featuring excellent film uniformity, density, and sputtering stability. It is suitable for various coating processes, such as magnetron sputtering and ion beam sputtering...

Brand Name:FGD

Model Number:fgd t-002

Place of Origin:China

...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...

Brand Name:JINXING

Model Number:Chromium Sputtering Target

Place of Origin:China

Chromium Sputtering Target Chromium sputtering target material is silvery white shiny metal, pure chromium has ductility, and chromium containing impurities is hard and brittle. The density is 7.19g/...

Brand Name:JINXING

Model Number:Copper Sputtering Target

Place of Origin:China

Copper Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999% For ...

Brand Name:JINXING

Model Number:Copper Rotatable Sputtering Target

Place of Origin:China

Copper Rotatable Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999...

Brand Name:JINXING

Model Number:Copper Plate Sputtering Target

Place of Origin:China

Copper Plate Sputtering Target Ultra high purity 99.999%, 99.9999% 6N ultra-high purity electrolytic copper is mainly used in the production of sputtering target, evaporation film and anode materials for integrated circuits. Purity: 99.999% ~ 99.9999% For ...